Ho presentato la mia candidatura di persona. Ho sostenuto un colloquio presso EPAM Systems (Biškek) nel mese di feb 2022
Colloquio
Applied for the position of .NET developer in the Kyrgyz Republic. The interview consisted of 2 parts 1) Initial acquaintance 2) Technical part Regarding the first two parts - everything went quite smoothly, at the technical interview the communication was in the spirit of communication between two colleagues about various technologies, its quality pleased. But then a typical EPAM happened, for a month I waited for the promised feedback and did not wait for it from the Senior Recruiter specialist. Then he wrote himself and found out that HR forgot about me because of personal problems. Didn't a large company find someone to replace her in order to at least write me about the results within a month? Based on this and my previous experience with EPAM, all I can say is avoid this company, it's not worth it.
Ho presentato la mia candidatura online. Ho sostenuto un colloquio presso EPAM Systems (Tbilisi) nel mese di giu 2026
Colloquio
interview was online and asked general c# .net questions about oop,gc,arraylist also was coding tasks like find numbers of same elements in string and sql query to join tables by same table and so on
technical screening followed by deep dives into C#, ASP.NET Core, and SQL. You’ll likely face coding challenges (Data Structures/Algorithms) and architectural discussions regarding design patterns, dependency injection, and cloud integration, concluding with behavioral rounds.
Domande di colloquio [1]
Domanda 1
Explain the difference between IEnumerable and IQueryable in LINQ.
Ho presentato la mia candidatura tramite un selezionatore. Ho sostenuto un colloquio presso EPAM Systems
Colloquio
Entrevista en ingles. Eran dos personas, uno de ellos hacia preguntas sobre Cloud (Azure) y la otra persona preguntaba sobre .NET.
Estuvo bien, preguntas complejas. Al final un live codign.
Domande di colloquio [1]
Domanda 1
- Optimización de query en EF.
- Decorators
- Patrones, KISS, DRY, etc